Sputter
DE500DL Sputter
DE500DUL Sputter
● Ultra-high vacuum pressure: <9e-9 Torr
● Up to 6 sputter guns
● Multilayer film deposition or co-sputtering
● DC, Pulse DC, RF power supply
● Metal, oxide or nitride sputtering
● Superconducting Thin Film Sputtering
● Josephson Junction sputtering
● Unique substrate fixture
● Excellent film uniformity and quality
● Automatic control
DE600DL Sputter
● High vacuum pressure: <5e-8 Torr
● Up to 4 sputter guns
● Multilayer film deposition or co-sputtering
● DC, Pulse DC, RF or HIPIMS power supply
● Metal, oxide or nitride sputtering
● Custom substrate fixture for batch coating
● Excellent film uniformity and quality
● Automatic control
● Ideal tool for R&D and production