Sputter

DE500DL
DE500DUL
DE600DL
DE700PVD
DE5000

DE500DL Sputter

 ●  High vacuum pressure: <2e-8 Torr

 ●  Up to 6 sputter guns

 ●  Multilayer film deposition or co-sputtering

 ●  DC, Pulse DC, RF or HIPIMS power supply

 ●  Metal, oxide or nitride sputtering

 ●  Custom substrate fixture

 ●  Excellent film uniformity and quality

 ●  Automatic control

 

DE500DUL Sputter

 ●  Ultra-high vacuum pressure: <9e-9 Torr

 ●  Up to 6 sputter guns

 ●  Multilayer film deposition or co-sputtering

 ●  DC, Pulse DC, RF power supply

 ●  Metal, oxide or nitride sputtering

 ●  Superconducting Thin Film Sputtering

 ●  Josephson Junction sputtering

 ●  Unique substrate fixture

 ●  Excellent film uniformity and quality

 ●  Automatic control

 

DE600DL Sputter

 ●  High vacuum pressure: <2e-8 Torr

 ●  up to 12 sputter guns

 ●  Multilayer film deposition or co-sputtering

 ●  DC, Pulse DC, RF or HIPIMS power supply

 ●  Metal, oxide or nitride sputtering

 ●  Custom substrate fixture

 ●  Excellent film uniformity and quality

 ●  Automatic control

DE700PVD  Sputter

 ●  High vacuum pressure: <5e-8 Torr

 ●  Up to 4 sputter guns

 ●  Multilayer film deposition or co-sputtering

 ●  DC, Pulse DC, RF or HIPIMS power supply

 ●  Metal, oxide or nitride sputtering

 ●  Custom substrate fixture for batch coating

 ●  Excellent film uniformity and quality

 ●  Automatic control

 ●  Ideal tool for R&D and production

DE5000 Cluster Sputter

 ●  Multi sputtering chambers or other process

 ●  High or Ultra-high vacuum pressure

 ●  DC, Pulse DC, RF or HIPIMS sputtering

 ●  Metal, oxide or nitride sputtering

 ●  Custom substrate fixture

 ●  Excellent film uniformity and quality

 ●  Robot substrate transfer

 ●  Optional EFEM for Fab

 ●  Automatic control